Title :
Effect of deposition temperature of amorphous carbon thin films
Author :
Fadzilah, A.N. ; Rusop, M.
Author_Institution :
NANO- Electron. Center (NET), Univ. Teknol. MARA (UiTM), Shah Alam, Malaysia
Abstract :
The work presented here shows the effect of deposition temperature on amorphous carbon (a-C) thin films. The a-C thin film were deposited on glass substrate by pyrolysing camphor oil at various temperature using the Chemical Vapor Deposition (CVD) technique. The films were prepared at various deposition temperature ranging from 350°C to 500°C. The electrical, optical and structural properties were characterized by current-voltage (I-V) Measurement, UV-VIS-NIR Spectrophotometer and Atomic Force Microscopy (AFM) respectively. As the deposition temperature increase, the conductivity increased but the optical band gap decrease from 1.5eV to 0.5eV due to the formation of more sp2 bonded carbon configuration.
Keywords :
amorphous state; atomic force microscopy; carbon; chemical vapour deposition; electrical conductivity; energy gap; infrared spectra; optical constants; pyrolysis; thin films; ultraviolet spectra; visible spectra; C; UV-VIS-NIR spectrophotometer; amorphous carbon thin films; atomic force microscopy; chemical vapor deposition; current-voltage measurement; deposition temperature; electrical conductivity; electron volt energy 1.5 eV to 0.5 eV; glass substrate; optical band gap; pyrolysing camphor oil; sp2 bonded carbon configuration; temperature 350 degC to 500 degC; Carbon; Distance measurement; Nitrogen; Optical films; Optical imaging; Optical variables measurement; Chemical Vapor Deposition (CVD); Electrical properties; Optical properties; Structural properties; a-C thin films;
Conference_Titel :
Electronic Devices, Systems and Applications (ICEDSA), 2011 International Conference on
Conference_Location :
Kuala Lumpur
Print_ISBN :
978-1-61284-388-9
DOI :
10.1109/ICEDSA.2011.5959071
