Title :
Thin FC film for sidewall passivation in SCREAM process for MEMS
Author :
Vrtacnik, D. ; Resnik, D. ; Aljancic, U. ; Mozek, M. ; Penic, S. ; Amon, S.
Abstract :
SCREAM process for releasing micromechanical MEMS structures using plasma polymerized fluorocarbon thin film for trench sidewall passivation is reported. The developed process is designed as a one mask process, and all etchings and depositions are fabricated in the same etching system (standard capacitive coupled RIE), as one-step-one-run process.
Keywords :
etching; masks; micromechanical devices; passivation; polymer films; FC film; MEMS; SCREAM process; mask process; micromechanical MEMS structures; one-step-one-run process; plasma polymerized fluorocarbon thin film; single-crystal reactive etching and metallization; standard capacitive coupled RIE; trench sidewall passivation; Electrodes; Etching; Micromechanical devices; Optical films; Passivation; Plasma applications; Plasma temperature; Polymer films; Silicon; Sputtering; MEMS; RIE; SCREAM; comb structure thin films; fluorocarbon; passivation;
Conference_Titel :
AFRICON 2007
Conference_Location :
Windhoek
Print_ISBN :
978-1-4244-0987-7
Electronic_ISBN :
978-1-4244-0987-7
DOI :
10.1109/AFRCON.2007.4401632
