• DocumentCode
    2365990
  • Title

    A Practical Electrolyte for the Electrodeposition of Eutectic Gold/Tin Alloy

  • Author

    Hradil, George

  • Author_Institution
    Technic Inc., Cranston, RI
  • fYear
    0
  • fDate
    0-0 0
  • Firstpage
    45
  • Lastpage
    50
  • Abstract
    Gold-tin alloys are useful in many microelectronic applications, including chip bonding and wafer bump plating. The 80-20 wt% (70-30 at%) gold-tin eutectic alloy is particularly desirable as a solder. Electro-deposition is a low cost alternative to currently employed techniques such as sputtering, plasma jet or the use of solid alloy preforms
  • Keywords
    electroplating; eutectic alloys; gold alloys; solders; tin alloys; chip bonding; electrodeposition; electrolyte; eutectic alloy; gold alloy; microelectronic applications; plasma jet; solder; solid alloy performs; sputtering; tin alloy; wafer bump plating; Current density; Gold alloys; Microelectronics; Plasma applications; Preforms; Solids; Sputtering; Stability; Tin alloys; Wafer bonding; Gold; Tin; alloy; eutectic; plating;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Advanced Packaging Materials: Processes, Properties and Interface, 200611th International Symposium on
  • Conference_Location
    Atlanta, GA
  • ISSN
    1550-5723
  • Print_ISBN
    1-4244-0260-3
  • Type

    conf

  • DOI
    10.1109/ISAPM.2006.1665994
  • Filename
    1665994