• DocumentCode
    2366284
  • Title

    Simulation study of nanoparticle melting behavior for lead free nano solder application

  • Author

    Hai Dong ; Kyoung-sik Moon ; Hongjin Jiang ; Wong, C.P.

  • Author_Institution
    Sch. of Mater. Sci. & Eng., Georgia Inst. of Technol., Atlanta, GA
  • fYear
    0
  • fDate
    0-0 0
  • Firstpage
    107
  • Lastpage
    107
  • Abstract
    Summary form only given. Silver nanoparticle was used as model system for melting behavior study due to its wide application in the field of microelectronic packaging and the availability of force field. The embedded atom method (EAM) was employed in conjunction with molecular dynamics (MD) simulations to investigate the effect of particle size and temperature ramping up rate on nano silver melting behavior. Silver spheres with diameter of 10 nm and 4 nm were prepared, and the temperature was raised up to 1200 K at a ramping up rate of 0.1K/ps and 1K/ps respectively. [010] projection and pair correlation function (PCF) were applied to study the structural evolution of silver particles as temperature is ramping up. The melting point was derived by observing the abrupt increase in potential energy. The effect of particle size and temperature ramping up rate on melting point was investigated. Surface melting behavior was studied by comparing the micro-structure of silver atoms located in core/shell regions
  • Keywords
    melting; molecular dynamics method; nanoparticles; particle size; silver; 10 nm; 4 nm; Ag; embedded atom method; lead free nanosolder; molecular dynamics simulations; nanoparticle melting behavior; nanosilver melting behavior; pair correlation function; particle size; potential energy; silver nanoparticle; silver particles; temperature ramping up rate; Environmentally friendly manufacturing techniques; Lead; Materials science and technology; Microelectronics; Moon; Packaging; Potential energy; Silver; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Advanced Packaging Materials: Processes, Properties and Interface, 200611th International Symposium on
  • Conference_Location
    Atlanta, GA
  • ISSN
    1550-5723
  • Print_ISBN
    1-4244-0260-3
  • Type

    conf

  • DOI
    10.1109/ISAPM.2006.1666010
  • Filename
    1666010