Title :
A novel vinyl ether resin of poly(4-vinylphenol) derivative for lithographic resist
Author :
Zhang, Jian ; Ge, Haixiong
Author_Institution :
Nat. Lab. of Solid State Microstructures & Dept. of Mater. Sci. & Eng., Nanjing Univ., Nanjing
Abstract :
Vinyl ether (VE) resins are considered as high reactive monomers which undergo a fast cationic polymerization in the presence of photogenerated protonic acids, so VE-based resins appear to be an attractive alternative to the widely used acrylate resins in UV-curing. To examine the VE resin properties, it is utilized as negative photoresist.
Keywords :
curing; photoresists; polymerisation; polymers; UV-curing; cationic polymerization; high reactive monomers; lithographic resist; negative photoresist; photogenerated protonic acids; poly(4-vinylphenol) derivative; vinyl ether resin; Nanoelectronics; Resins; Resists;
Conference_Titel :
Nanoelectronics Conference, 2008. INEC 2008. 2nd IEEE International
Conference_Location :
Shanghai
Print_ISBN :
978-1-4244-1572-4
Electronic_ISBN :
978-1-4244-1573-1
DOI :
10.1109/INEC.2008.4585519
