DocumentCode :
2367055
Title :
Circuit-level simulation of CDM-ESD and EOS in submicron MOS devices
Author :
Ramaswamy, Sridhar ; Li, Erhong ; Rosenbaum, Elyse ; Kang, Sung-Mo
Author_Institution :
Coordinated Sci. Lab., Illinois Univ., Urbana, IL, USA
fYear :
1996
fDate :
10-12 Sept. 1996
Firstpage :
316
Lastpage :
321
Abstract :
In this paper, we present a compact electrothermal device model which can be used to simulate NMOS devices operating in the snapback regime. By incorporating temperature dependencies in the device model and using the electrothermal circuit simulator iETSIM, we are able to simulate the second breakdown of NMOS devices under EOS stress. The NMOS model also incorporates the finite breakdown time effect which is important for simulating charge device model (CDM) ESD stress events.
Keywords :
MOSFET; circuit analysis computing; electric breakdown; electrostatic discharge; equivalent circuits; semiconductor device models; thermal analysis; CDM-ESD; EOS stress; NMOS device simulation; NMOS model; charge device model ESD stress events; circuit-level simulation; compact electrothermal device model; electrothermal circuit simulator; finite breakdown time effect; iETSIM; parameter extraction; second breakdown; snapback regime; submicron MOS devices; temperature dependencies; Circuit simulation; Electrostatic discharges; Equivalent circuits; MOSFETs; Second breakdown; Semiconductor device modeling; Semiconductor device thermal factors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electrical Overstress/Electrostatic Discharge Symposium, 1996. Proceedings
Print_ISBN :
1-878303-69-4
Type :
conf
DOI :
10.1109/EOSESD.1996.865158
Filename :
865158
Link To Document :
بازگشت