• DocumentCode
    2367225
  • Title

    Nanoelectronic circuit architectures based on single-electron turnstiles

  • Author

    Zhang, Wancheng ; Wu, Nan-Jian

  • Author_Institution
    State Key Lab. for Superlattices & Microstruct., Chinese Acad. of Sci., Beijing
  • fYear
    2008
  • fDate
    24-27 March 2008
  • Firstpage
    515
  • Lastpage
    519
  • Abstract
    Single-electron devices (SEDs) have ultra-low power dissipation and high integration density, which make them promising candidates as basic circuit elements of the next generation VLSI circuits. In this paper, we propose two novel circuit single-electron architectures: the single-electron simulated annealing algorithm (SAA) circuit and the single-electron cellular neural network (CNN). We used the MOSFET-based single-electron turnstile as the basic circuit element. The SAA circuit consists of the voltage-controlled single-electron random number generator and the single-electron multiple-valued memories (SEMVs). The random-number generation and variable variations in SAA are easily achieved by transferring electrons using the single-electron turnstile. The CNN circuit used the floating-gate single-electron turnstile as the neural synapses, and the number of electrons is used to represent the cells states. These novel circuits are promising in future nanoscale integrated circuits.
  • Keywords
    MOSFET circuits; VLSI; cellular neural nets; nanoelectronics; random number generation; simulated annealing; single electron devices; MOSFET single-electron turnstile; VLSI circuits; floating-gate single-electron turnstile; nanoelectronic circuit architecture; nanoscale integrated circuits; single-electron architecture; single-electron cellular neural network; single-electron devices; single-electron multiple-valued memory; single-electron simulated annealing algorithm circuit; single-electron turnstiles; voltage-controlled single-electron random number generator; Circuits; Nanoelectronics;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanoelectronics Conference, 2008. INEC 2008. 2nd IEEE International
  • Conference_Location
    Shanghai
  • Print_ISBN
    978-1-4244-1572-4
  • Electronic_ISBN
    978-1-4244-1573-1
  • Type

    conf

  • DOI
    10.1109/INEC.2008.4585539
  • Filename
    4585539