DocumentCode :
2367645
Title :
Full-band Monte Carlo simulation of high-energy transport and impact ionization of electrons and holes in Ge, Si, and GaAs
Author :
Fischetti, M.V. ; Sano, N. ; Laux, S.E. ; Natori, K.
Author_Institution :
IBM Thomas J. Watson Res. Center, Yorktown Heights, NY, USA
fYear :
1996
fDate :
2-4 Sept. 1996
Firstpage :
43
Lastpage :
44
Abstract :
In this work we have computed the rate for impact ionization ab initio and have employed this rate in full-band Monte Carlo simulations in order to determine the high-energy carrier-phonon deformation potentials. We have considered transport and impact ionization of electrons and holes in Ge, Si, and GaAs, the valence bands being treated with nonlocal empirical pseudopotentials and spin-orbit interaction. The impact ionization rates have been computed using three different approximations: (1) the ab initio rate, which accounts for energy and momentum conservation and for the dependence of the Coulomb matrix element on both initial and final states, (2) the constant-matrix-element (CME) approximation, which employee a constant Coulomb matrix element, and (3) the random-k approximation, which relaxes momentum-conservation.
Keywords :
III-V semiconductors; Monte Carlo methods; electron-phonon interactions; elemental semiconductors; gallium arsenide; germanium; impact ionisation; pseudopotential methods; silicon; spin-orbit interactions; Coulomb matrix element; GaAs; Ge; Si; ab initio rate; carrier-phonon deformation potential; constant-matrix-element approximation; full-band Monte Carlo simulation; high-energy transport; impact ionization; nonlocal empirical pseudopotential; random-k approximation; spin-orbit interaction; valence band; Calibration; Charge carrier processes; Computational modeling; Data mining; Deformable models; Electrons; Gallium arsenide; Impact ionization; Monte Carlo methods; Physics;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Simulation of Semiconductor Processes and Devices, 1996. SISPAD 96. 1996 International Conference on
Print_ISBN :
0-7803-2745-4
Type :
conf
DOI :
10.1109/SISPAD.1996.865265
Filename :
865265
Link To Document :
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