DocumentCode
2367833
Title
A new practical method to include recombination-generation process in self-consistent Monte Carlo device simulation
Author
Jin, Gyoyoung ; Kan, Edwin C. ; Dutton, Robert W.
Author_Institution
Stanford Univ., CA, USA
fYear
1996
fDate
2-4 Sept. 1996
Firstpage
61
Lastpage
62
Abstract
A new practical method to incorporate recombination-generation (R-G) processes into self consistent Monte Carlo (MC) device simulation is considered. To calculate the R-G rate, a phenomenological expression like that for the well-known SRH mechanism is used instead of treating carriers in the microscopic interaction level. The most abundant and accurate information in MC simulation, carrier concentrations, can be utilized more directly to enhance the statistical stability and accuracy for the R-G effects. Realistic device examples, the minority carrier injection of a forward-biased n+-p diode and the body effect from impact ionization of a 800 Å thin-film SOI MOSFET, are used to demonstrate the validity of this approach.
Keywords
MOSFET; Monte Carlo methods; carrier density; electron-hole recombination; impact ionisation; minority carriers; semiconductor device models; semiconductor diodes; silicon-on-insulator; simulation; Monte Carlo device simulation; Si; body effect; carrier concentration; forward-biased n+-p diode; impact ionization; minority carrier injection; recombination-generation process; self-consistent device simulation; statistical stability; thin-film SOI MOSFET; Charge carrier processes; Computational modeling; Electrons; Microscopy; Monte Carlo methods; Particle scattering; Plasma simulation; Poisson equations; Spontaneous emission; Steady-state;
fLanguage
English
Publisher
ieee
Conference_Titel
Simulation of Semiconductor Processes and Devices, 1996. SISPAD 96. 1996 International Conference on
Print_ISBN
0-7803-2745-4
Type
conf
DOI
10.1109/SISPAD.1996.865274
Filename
865274
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