DocumentCode :
2367874
Title :
Product drift from NBTI: Guardbanding, circuit and statistical effects
Author :
Krishnan, Anand T. ; Cano, Frank ; Chancellor, Cathy ; Reddy, Vijay ; Qi, Zhangfen ; Jain, Palkesh ; Carulli, John ; Masin, Jonathan ; Zuhoski, Steve ; Krishnan, Srikanth ; Ondrusek, Jay
Author_Institution :
Technol. Design Integration, Texas Instrum., Dallas, TX, USA
fYear :
2010
fDate :
6-8 Dec. 2010
Abstract :
Circuits employing advanced performance and power management techniques (clock gating, half-cycle paths) are found to be much more sensitive to NBTI primarily due to differential and asymmetric aging, with a 1% transistor drift leading to as much as 3% circuit drift in some cases. For the first time, we report a monotonic reduction in variance of the log parameters (Ln(ΔF/F) and Ln(ΔID/ID)) as a function of stress time. A stochastic guard banding model accounting for time-dependent variance, re-ordering effects and granularity of data is demonstrated.
Keywords :
MOSFET; circuit stability; integrated circuit reliability; statistical analysis; stochastic processes; asymmetric aging; circuit drift; data granularity; differential aging; log parameter; monotonic reduction; negative bias temperature instability; power management technique; statistical effect; stochastic guard banding model; time-dependent variance; transistor drift;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting (IEDM), 2010 IEEE International
Conference_Location :
San Francisco, CA
ISSN :
0163-1918
Print_ISBN :
978-1-4424-7418-5
Electronic_ISBN :
0163-1918
Type :
conf
DOI :
10.1109/IEDM.2010.5703294
Filename :
5703294
Link To Document :
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