Title :
The first-principles calculation of the effects oxygen defect on the electronic structure of SnO2
Author :
Jun-Feng, Yan ; Zhi-yong, Zhang ; Fu-Chun, Zhang ; Jiang-Ni, Yun ; Wu, Zhao ; Zhou-Hu, Deng
Author_Institution :
Sch. of Inf. Sci. & Technol., Northwest Univ., Xi´´an
Abstract :
In order to investigate the effects oxygen defect on the electronic structure of SnO2, the structural change, band structure, density of states, and electron density difference of (11macr0) surface of SnO2 in the rutile lattice phase were performed by the first-principles calculation of plane wave ultra-soft pseudo-potential technology based on the density function theory. The calculated conclusions were revealed that the oxygen defect changed the inner energy of SnO2 crystal; the SnO2 with oxygen vacancy defects had high conductivity of semiconductor; while the defect of surplus oxygen atom in interstitial position cause to enhance the degeneracy of VBs and weaken the communizing motion of electrons. The research results strongly guide the technical process of preparing SnO2 thin film and powder in theory, and have scientific and theoretical value.
Keywords :
ab initio calculations; crystal structure; density functional theory; electrical conductivity; electronic density of states; interstitials; pseudopotential methods; semiconductor thin films; surface states; tin compounds; vacancies (crystal); valence bands; wide band gap semiconductors; (110) surface; SnO2; band structure; crystal inner energy; crystal structure; density function theory; density of states; electrical conductivity; electron density; electronic structure; first-principles calculation; interstitial; oxygen defect; plane wave ultrasoft pseudopotential technology; rutile lattice phase; transparent conducting film material; vacancy; valence band degeneracy; wide band-gap material; Nanoelectronics; First-principles; electronic structure; transparent conducting films;
Conference_Titel :
Nanoelectronics Conference, 2008. INEC 2008. 2nd IEEE International
Conference_Location :
Shanghai
Print_ISBN :
978-1-4244-1572-4
Electronic_ISBN :
978-1-4244-1573-1
DOI :
10.1109/INEC.2008.4585569