Three-dimensional photoresist exposure and development simulation

Among all technologies photolithography holds the leading position in pattern transfer in today´s semiconductor industry. The reduction of the lithographic feature sizes towards or even beyond the used wavelength and the increasing nonplanarity of devices create complicated problems for the lithography process. A three-dimensional photolithography simulator including mask illumination, resist exposure and resist development is a cost effective tool for further improvements. We present a complete three-dimensional simulation model focusing on the resist exposure and resist development step.