• DocumentCode
    236823
  • Title

    Ground guard structure to reduce the crosstalk noise and electromagnetic interference (EMI) in a vertical probe card for wafer-level testing

  • Author

    Eunjung Lee ; Manho Lee ; Kim, Jonghoon J. ; Mijoo Kim ; Jonghoon Kim ; Joungho Kim ; Jeoungkun Park ; Younghoon Joo ; Yoonhee Bang ; Il Kim ; Seungki Nam

  • Author_Institution
    Dept. of EE, Korea Adv. Inst. of Sci. & Technol., Daejeon, South Korea
  • fYear
    2014
  • fDate
    4-8 Aug. 2014
  • Firstpage
    260
  • Lastpage
    264
  • Abstract
    Wafer-level testing is an important process in integrated circuit (IC) manufacturing to enhance the yield and reduce costs. The development of a vertical probe card enables the testing of low-voltage and high-frequency devices with reduced probe lengths compared to conventional probe cards. Despite these advantages, crosstalk noise and electromagnetic interference (EMI) have alarmingly become a serious problem with smaller pad sizes, higher pad densities, and increased signal input/output frequencies. In this paper, we propose a new ground guard structure of needle in a vertical probe card to reduce crosstalk noise and EMI. The effect of the proposed ground guard structure is analyzed in the frequency- and time-domains. To validate the effect, the original structure and the proposed ground guard structure are compared. The ground guard structure is designed with a 3D electromagnetic solver and the results are visualized by means of S-parameter curves and eye-diagrams. Also, the reduction of the radiated near-field emission is presented through a 3D polar plot. The simulation results successfully confirm that the proposed ground guard structure effectively reduces the crosstalk noise and radiated emission.
  • Keywords
    S-parameters; crosstalk; electromagnetic interference; frequency-domain analysis; frequency-domain synthesis; integrated circuit manufacture; integrated circuit testing; interference suppression; 3D electromagnetic solver; 3D polar plot; EMI reduction; IC manufacturing; S-parameter curves; crosstalk noise reduction; electromagnetic interference; eye-diagrams; frequency-domains; ground guard structure; high-frequency devices; integrated circuit manufacturing; low-voltage devices; pad densities; pad sizes; radiated near-field emission reduction; signal input-output frequencies; time-domains; vertical probe card; wafer-level testing; Ceramics; Crosstalk; Electromagnetic interference; Metals; Needles; Probes; Testing; EMI; Wafer-level testing; crosstalk; needle; vertical probe card;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electromagnetic Compatibility (EMC), 2014 IEEE International Symposium on
  • Conference_Location
    Raleigh, NC
  • Print_ISBN
    978-1-4799-5544-2
  • Type

    conf

  • DOI
    10.1109/ISEMC.2014.6898981
  • Filename
    6898981