DocumentCode :
2368247
Title :
Research of mechanism on the improvement of silicon carbide ohmic contact property influenced by nanometer metal particles
Author :
Yanfeng, Jiang ; Bing, Yang ; Xiaobo, Zhang ; Jiaxin, Ju
Author_Institution :
Microelectron. Center, North China Univ. of Technol., Beijing
fYear :
2008
fDate :
24-27 March 2008
Firstpage :
708
Lastpage :
710
Abstract :
It has been proved by experimental results that the ohmic contact property of silicon carbide can be improved by using some specific nanometer metal particles. In this paper, authors have constructed a quantum tunneling models to explain the experimental results. The influences of parameters on the ohmic contact characteristics have been calculated based on the models. The values show that the tunneling effect can be observed by adding nanometer particles. The tunneling probability has been increased. Moreover, with the existence of nanometer particles, pinning of Fermi level has been conquered. So, it is an effective method by using specific nanometer metal particles to improve the characteristic of P-type silicon carbide ohmic contact.
Keywords :
Fermi level; nanoparticles; ohmic contacts; quantum theory; silicon compounds; tunnelling; Fermi level; P-type silicon carbide ohmic contact; SiC; nanometer metal particles; quantum tunneling models; tunneling effect; tunneling probability; Mechanical factors; Nanoelectronics; Ohmic contacts; Silicon carbide;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanoelectronics Conference, 2008. INEC 2008. 2nd IEEE International
Conference_Location :
Shanghai
Print_ISBN :
978-1-4244-1572-4
Electronic_ISBN :
978-1-4244-1573-1
Type :
conf
DOI :
10.1109/INEC.2008.4585583
Filename :
4585583
Link To Document :
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