• DocumentCode
    2368415
  • Title

    Self-polarized capacitive silicon micromechanical resonators via charge trapping

  • Author

    Samarao, Ashwin K. ; Ayazi, Farrokh

  • Author_Institution
    Sch. of Electr. & Comput. Eng., Georgia Inst. of Technol., Atlanta, GA, USA
  • fYear
    2010
  • fDate
    6-8 Dec. 2010
  • Abstract
    We present for the first time a charge trapping technique as a viable passive biasing mechanism for capacitive silicon micromechanical resonators. Potential wells are created on the surface of the microresonator to trap charges for mimicking a polarization voltage (Vp) of 8 V. With no externally applied Vp, the resonance peak of a 20 μm thick silicon bulk acoustic resonator (SiBAR) with 50 nm transduction air-gaps comes up by ~25 dB from the noise floor. An insertion loss (I.L.) of 30.7 dB and a quality factor (Q) of 59,000 has been measured in vacuum at a resonance frequency of 104.81 MHz.
  • Keywords
    elemental semiconductors; micromechanical resonators; silicon; Si; bulk acoustic resonator; charge trapping; frequency 104.81 MHz; microresonator; self-polarized capacitive silicon micromechanical resonators; size 20 mum; voltage 8 V; wavelength 50 nm;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting (IEDM), 2010 IEEE International
  • Conference_Location
    San Francisco, CA
  • ISSN
    0163-1918
  • Print_ISBN
    978-1-4424-7418-5
  • Electronic_ISBN
    0163-1918
  • Type

    conf

  • DOI
    10.1109/IEDM.2010.5703316
  • Filename
    5703316