Simulation environment for semiconductor technology analysis

Author

Pichler, Ch. ; Plasun, R. ; Strasser, R. ; Selberherr, S.

Author_Institution

Inst. for Microelectron., Tech. Univ. Wien, Austria

fYear

1996

fDate

2-4 Sept. 1996

Firstpage

147

Lastpage

148

Abstract

A programmable simulation environment for semiconductor technology analysis is presented. The SIESTA project sets out to combine the advantages of a comfortable, intuitive visual user interface with the flexibility and versatility of a high-level programming language. It is designed to provide a set of framework services to ensure a straight-forward definition of complex technology analysis tasks. Special emphasis has been put on establishing in an object-oriented fashion a uniform and easy-to-use interface for applications and extensions supplied by the user. LISP objects are used to represent basic entities like process steps, process flows, experiments, and agents for design of experiments (DoE), response surface modeling (RSM), and optimization and fitting modules.

Keywords

semiconductor process modelling; LISP; SIESTA; TCAD; design of experiments; fitting module; high-level programming language; object-oriented method; optimization module; process flow; programmable simulation environment; response surface modeling; semiconductor technology analysis; visual user interface; Analytical models; Computational modeling; Concurrent computing; Design optimization; Object oriented modeling; Performance evaluation; Response surface methodology; Surface fitting; US Department of Energy; User interfaces;

fLanguage

English

Publisher

ieee

Conference_Titel

Simulation of Semiconductor Processes and Devices, 1996. SISPAD 96. 1996 International Conference on

Print_ISBN

0-7803-2745-4

Type

conf

DOI

10.1109/SISPAD.1996.865314

Filename

865314