• DocumentCode
    2368783
  • Title

    RF performance of short channel graphene field-effect transistor

  • Author

    Wu, Y.Q. ; Lin, Y.-M. ; Jenkins, K.A. ; Ott, J.A. ; Dimitrakopoulos, C. ; Farmer, D.B. ; Xia, F. ; Grill, A. ; Antoniadis, D.A. ; Avouris, Ph.

  • Author_Institution
    T.J. Watson Res. Center, IBM, Yorktown Heights, NY, USA
  • fYear
    2010
  • fDate
    6-8 Dec. 2010
  • Abstract
    In this paper, the authors present experimental studies on transport characteristics of graphene FETs with channel lengths down to 70 nm. The factors limiting the performance of short channel graphene devices are discussed. RF performance of a sub-100 nm graphene transistor fabricated on epitaxial graphene grown on a SiC substrate is also presented. A cut-off frequency as high as 170 GHz is achieved in a 90 nm graphene FET using a scalable top-down fabrication processes. Our results indicate that further improvement of RF performance of graphene FETs can be enabled by channel length scaling with structure optimization and contact resistance reduction.
  • Keywords
    epitaxial growth; field effect transistors; graphene; silicon compounds; wide band gap semiconductors; SiC; channel length scaling; contact resistance reduction; epitaxial graphene; epitaxial growth; frequency 170 GHz; scalable top-down fabrication; short channel graphene field-effect transistor; size 70 nm; size 90 nm; structure optimization;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting (IEDM), 2010 IEEE International
  • Conference_Location
    San Francisco, CA
  • ISSN
    0163-1918
  • Print_ISBN
    978-1-4424-7418-5
  • Electronic_ISBN
    0163-1918
  • Type

    conf

  • DOI
    10.1109/IEDM.2010.5703331
  • Filename
    5703331