DocumentCode
2368783
Title
RF performance of short channel graphene field-effect transistor
Author
Wu, Y.Q. ; Lin, Y.-M. ; Jenkins, K.A. ; Ott, J.A. ; Dimitrakopoulos, C. ; Farmer, D.B. ; Xia, F. ; Grill, A. ; Antoniadis, D.A. ; Avouris, Ph.
Author_Institution
T.J. Watson Res. Center, IBM, Yorktown Heights, NY, USA
fYear
2010
fDate
6-8 Dec. 2010
Abstract
In this paper, the authors present experimental studies on transport characteristics of graphene FETs with channel lengths down to 70 nm. The factors limiting the performance of short channel graphene devices are discussed. RF performance of a sub-100 nm graphene transistor fabricated on epitaxial graphene grown on a SiC substrate is also presented. A cut-off frequency as high as 170 GHz is achieved in a 90 nm graphene FET using a scalable top-down fabrication processes. Our results indicate that further improvement of RF performance of graphene FETs can be enabled by channel length scaling with structure optimization and contact resistance reduction.
Keywords
epitaxial growth; field effect transistors; graphene; silicon compounds; wide band gap semiconductors; SiC; channel length scaling; contact resistance reduction; epitaxial graphene; epitaxial growth; frequency 170 GHz; scalable top-down fabrication; short channel graphene field-effect transistor; size 70 nm; size 90 nm; structure optimization;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting (IEDM), 2010 IEEE International
Conference_Location
San Francisco, CA
ISSN
0163-1918
Print_ISBN
978-1-4424-7418-5
Electronic_ISBN
0163-1918
Type
conf
DOI
10.1109/IEDM.2010.5703331
Filename
5703331
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