A simple method to fabricate silicon nanowires arrays by a catalytic electrochemical etching process

We present a simple method to fabricate large area of silicon nanowires array with low-cost and throughput by a catalytic electrochemical etching process. In our experiment, a thin layer of polyelectrolyte (PAH) was used to absorb negatively charged PS sphere. Using the PS sphere as mask, the silicon nanowires arrays were fabricated by a silver catalytic electrochemical etching process. By SEM and Raman spectrum, the structure and properties of silicon nanowires arrays were also studied.