DocumentCode :
2369161
Title :
A novel low-voltage biasing scheme for double gate FBC achieving 5s retention and 1016 endurance at 85°C
Author :
Lu, Z. ; Collaert, N. ; Aoulaiche, M. ; De Wachter, B. ; De Keersgieter, An ; Schwarzenbach, W. ; Bonnin, O. ; Bourdelle, K.K. ; Nguyen, B.Y. ; Mazure, C. ; Altimime, L. ; Jurczak, M.
Author_Institution :
Imec, Leuven, Belgium
fYear :
2010
fDate :
6-8 Dec. 2010
Abstract :
We demonstrate a novel low-voltage biasing scheme on ultra-thin BOX (UTBOX) FDSOI floating body cells with Lg=55nm and tSi=20nm. By optimizing the front and back gate biasing to enhance the positive feedback loop, the required VDS can be reduced to 1.5V while retention times as high as 5s can still be achieved at 85°C. For the first time, we also show that the stringent endurance spec of 1016 cycles can be met as a result of the VDS reduction.
Keywords :
DRAM chips; low-power electronics; silicon-on-insulator; double gate FBC; low-voltage biasing scheme; temperature 85 degC; time 5 s; ultra-thin BOX FDSOI floating body cells;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting (IEDM), 2010 IEEE International
Conference_Location :
San Francisco, CA
ISSN :
0163-1918
Print_ISBN :
978-1-4424-7418-5
Electronic_ISBN :
0163-1918
Type :
conf
DOI :
10.1109/IEDM.2010.5703347
Filename :
5703347
Link To Document :
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