Author :
Wuu, S.G. ; Wang, C.C. ; Hseih, B.C. ; Tu, Y.L. ; Tseng, C.H. ; Hsu, T.H. ; Hsiao, R.S. ; Takahashi, S. ; Lin, R.J. ; Tsai, C.S. ; Chao, Y.P. ; Chou, K.Y. ; Chou, P.S. ; Tu, H.Y. ; Hsueh, F.L. ; Tran, L.
Abstract :
This paper presents process breakthroughs that enable a BSI 0.9μm pixel formation and its performance. The technology was developed using 300mm bulk silicon starting wafers with the state-of-the-art tool set for BSI sensor processing. This is the first demonstration of 0.9μm BSI pixel with acceptable optical performance. Further improvements are in the area of crosstalk suppression and color performance enhancement for continuous pixel scaling from 0.9μm.
