DocumentCode :
2369553
Title :
TCAD: Present state and future challenges
Author :
Ma, Terry ; Moroz, Victor ; Borges, Ricardo ; Smith, Lee
Author_Institution :
Synopsys, Inc., Mountain View, CA, USA
fYear :
2010
fDate :
6-8 Dec. 2010
Abstract :
Since the advent of computer modeling of semiconductor processes and devices in the 1970s, Technology Computer-Aided Design (TCAD) has been an integral part of technology development over the past four decades. Today, the use of TCAD has become widespread not only for “More Moore,” but also “More Than Moore” technologies (Fig. 1). As process and device complexity continues to rise, so does the complexity in technology modeling. This paper discusses the present state and future challenges of front-end process and device modeling.
Keywords :
circuit CAD; TCAD; computer modeling; device complexity; semiconductor devices; semiconductor processes; technology computer-aided design; technology development; technology modeling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting (IEDM), 2010 IEEE International
Conference_Location :
San Francisco, CA
ISSN :
0163-1918
Print_ISBN :
978-1-4424-7418-5
Electronic_ISBN :
0163-1918
Type :
conf
DOI :
10.1109/IEDM.2010.5703367
Filename :
5703367
Link To Document :
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