DocumentCode :
2369647
Title :
Analysis of pocket profile deactivation and its impact on Vth variation for Laser annealed device using an atomistic kinetic Monte Carlo approach
Author :
Noda, T. ; Vandervorst, W. ; Vrancken, C. ; Ortolland, C. ; Rosseel, E. ; Eyben, P. ; Absil, P.P. ; Biesemans, S. ; Hoffmann, T.Y.
Author_Institution :
Panasonic Corp., Nagaokakyo, Japan
fYear :
2010
fDate :
6-8 Dec. 2010
Abstract :
An analysis of pocket profile deactivation and its impact on Vth variation for Laser annealed devices using an atomistic kinetic Monte Carlo (KMC) approach are shown. The Carbon co-implant impacts on pFET extension/pocket are also modeled using an atomistic KMC. KMC clarified that although B-pocket in nFET shows significant deactivation, As-pocket in pFET does not show deactivation with thermal budget scaling. pFET device shows smaller thermal budget scaling dependence of Vt mismatch than that of nFET. The difference of pocket deactivation is one of important reason for higher Vth mismatch for nFET than for pFET.
Keywords :
Monte Carlo methods; laser beam annealing; atomistic KMC; atomistic kinetic Monte Carlo approach; carbon coimplant impacts; laser annealed device; pocket deactivation; pocket profile deactivation; thermal budget scaling dependence;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting (IEDM), 2010 IEEE International
Conference_Location :
San Francisco, CA
ISSN :
0163-1918
Print_ISBN :
978-1-4424-7418-5
Electronic_ISBN :
0163-1918
Type :
conf
DOI :
10.1109/IEDM.2010.5703371
Filename :
5703371
Link To Document :
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