• DocumentCode
    2369647
  • Title

    Analysis of pocket profile deactivation and its impact on Vth variation for Laser annealed device using an atomistic kinetic Monte Carlo approach

  • Author

    Noda, T. ; Vandervorst, W. ; Vrancken, C. ; Ortolland, C. ; Rosseel, E. ; Eyben, P. ; Absil, P.P. ; Biesemans, S. ; Hoffmann, T.Y.

  • Author_Institution
    Panasonic Corp., Nagaokakyo, Japan
  • fYear
    2010
  • fDate
    6-8 Dec. 2010
  • Abstract
    An analysis of pocket profile deactivation and its impact on Vth variation for Laser annealed devices using an atomistic kinetic Monte Carlo (KMC) approach are shown. The Carbon co-implant impacts on pFET extension/pocket are also modeled using an atomistic KMC. KMC clarified that although B-pocket in nFET shows significant deactivation, As-pocket in pFET does not show deactivation with thermal budget scaling. pFET device shows smaller thermal budget scaling dependence of Vt mismatch than that of nFET. The difference of pocket deactivation is one of important reason for higher Vth mismatch for nFET than for pFET.
  • Keywords
    Monte Carlo methods; laser beam annealing; atomistic KMC; atomistic kinetic Monte Carlo approach; carbon coimplant impacts; laser annealed device; pocket deactivation; pocket profile deactivation; thermal budget scaling dependence;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting (IEDM), 2010 IEEE International
  • Conference_Location
    San Francisco, CA
  • ISSN
    0163-1918
  • Print_ISBN
    978-1-4424-7418-5
  • Electronic_ISBN
    0163-1918
  • Type

    conf

  • DOI
    10.1109/IEDM.2010.5703371
  • Filename
    5703371