DocumentCode
23709
Title
Optical Multichannel Imaging of Pulsed Laser Deposition of ZnO
Author
Jones, John G. ; Lirong Sun ; Murphy, Niall R. ; Jakubiak, Rachel
Author_Institution
Mater. & Manuf. Directorate, Air Force Res. Lab., Wright-Patterson AFB, OH, USA
Volume
42
Issue
10
fYear
2014
fDate
Oct. 2014
Firstpage
2590
Lastpage
2591
Abstract
Pulsed laser deposition is an efficient technique to obtain stoichiometric material transfer from target to substrate and has been used by researchers and in industry for depositing materials for use in applications ranging from hard coatings and superconductors to optical materials. The images detailed here will demonstrate the unique plume evolution that occurs and the high-speed ionic species, and slow-speed neutral and molecular species that travel from target material to substrate.
Keywords
II-VI semiconductors; optical images; pulsed laser deposition; semiconductor growth; semiconductor thin films; stoichiometry; wide band gap semiconductors; zinc compounds; ZnO; hard coatings; high-speed ionic species; molecular species; optical materials; optical multichannel imaging; plume evolution; pulsed laser deposition; slow-speed neutral species; stoichiometric material transfer; superconductors; High-speed optical techniques; Optical imaging; Optical pulses; Pulsed laser deposition; Substrates; Zinc oxide; Imaging; Zinc Oxide; materials preparation;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/TPS.2014.2342159
Filename
6876176
Link To Document