DocumentCode :
23713
Title :
Magnetoresistance Relaxation in Thin La-Sr-Mn-O Films Exposed to High-Pulsed Magnetic Fields
Author :
Zurauskiene, Nerija ; Balevicius, Saulius ; Pavilonis, Dainius ; Stankevic, Voitech ; Kersulis, Skirmantas ; Novickij, Jurij
Author_Institution :
Center for Phys. Sci. & Technol., Semicond. Phys. Inst., Vilnius, Lithuania
Volume :
41
Issue :
10
fYear :
2013
fDate :
Oct. 2013
Firstpage :
2830
Lastpage :
2835
Abstract :
Presented are the results of an investigation of colossal magnetoresistance relaxation in nanostructured La-Sr-Mn-O films after the removal of the magnetic field pulse. 400-nm thick films grown by the metal-organic chemical vapor deposition technique are studied in the magnetic field range of 2-10 T and a temperature range of 100-290 K using a pulsed magnetic field generator based on a capacitor bank discharge. A magnetic coil of special design with a nonmetallic outer casing made from polyamide materials allowed us to distinguish the relaxation processes occurring during three different time scales: ultrafast , fast ( ~ 100 μs), and slow ( ~ 1 ms). The dynamics of the fast relaxation is analyzed using the Kolmogorov-Avrami-Fatuzzo model, considering the reorientation of the magnetic domains into their equilibrium state. The slow relaxation is analyzed using the Kohlrausch-Williams-Watts model considering the short-range interaction of the magnetic moments in disordered grain boundaries having spin-glass properties.
Keywords :
MOCVD; coils; colossal magnetoresistance; grain boundaries; lanthanum compounds; magnetic domains; magnetic moments; magnetic relaxation; magnetic thin films; nanostructured materials; spin glasses; strontium compounds; Kohlrausch-Williams-Watts model; Kolmogorov-Avrami-Fatuzzo model; La-Sr-Mn-O; capacitor bank discharge; colossal magnetoresistance relaxation; equilibrium state; fast relaxation dynamics; grain boundaries; high-pulsed magnetic fields; magnetic coil; magnetic domain reorientation; magnetic field range; magnetic moments; metal-organic chemical vapor deposition technique; nanostructured films; nonmetallic outer casing; polyamide materials; pulsed magnetic field generator; short-range interaction; size 400 nm; spin-glass properties; temperature 100 K to 900 K; thin films; Coils; Conductivity; Magnetic domains; Plasma temperature; Saturation magnetization; Temperature measurement; Temperature sensors; Colossal magnetoresistance; magnetic field effects; magnetic field sensors; manganites; resistance relaxation processes; thin films;
fLanguage :
English
Journal_Title :
Plasma Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-3813
Type :
jour
DOI :
10.1109/TPS.2013.2261558
Filename :
6553160
Link To Document :
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