Title :
100GHz depletion-mode Ga2O3/GaN single nanowire MOSFET by photo-enhanced chemical oxidation method
Author :
Yu, Jeng-Wei ; Wu, Yuh-Renn ; Huang, Jian-Jang ; Peng, Lung-Han
Author_Institution :
Dept. of Electr. Eng., Nat. Taiwan Univ., Taipei, Taiwan
Abstract :
We reported transport characterization on [112̅0]GaN single nanowire (SNW)-MOSFET laterally- and directionally-grown on (0001) sapphire substrates. The 60nm-dia. Ga2O3/GaN SNW-MOSFET of 0.1μm gate length was shown to exhibit a saturation current of 160μA, current on/off ratio of 105, swing of 85mV/dec, transconductance of 85μS, and unity current gain bandwidth ft at 95GHz. From a 3D diffusion and drift model analysis, it is shown that a polarization induced 2D electron gas (2DEG) density of 7 × 1012 cm2 with mobility of 1000cm2/V-sec confined at the interface of semi-polar {11̅01̅} GaN/Ga2O3 was responsible for the high-speed transport characteristics.
Keywords :
MOSFET; nanowires; oxidation; polarisation; two-dimensional electron gas; 3D diffusion; Ga2O3-GaN; bandwidth 95 GHz; current 160 muA; depletion-mode single nanowire MOSFET; drift model analysis; frequency 100 GHz; high-speed transport characteristics; photo-enhanced chemical oxidation; polarization induced 2D electron gas density; sapphire substrate; saturation current; size 0.1 mum; transport characterization; unity current gain bandwidth;
Conference_Titel :
Electron Devices Meeting (IEDM), 2010 IEEE International
Conference_Location :
San Francisco, CA
Print_ISBN :
978-1-4424-7418-5
Electronic_ISBN :
0163-1918
DOI :
10.1109/IEDM.2010.5703450