DocumentCode :
2371372
Title :
High-performance monolithically-integrated E/D mode InAlN/AlN/GaN HEMTs for mixed-signal applications
Author :
Tang, Yong ; Saunier, Paul ; Wang, Ronghua ; Ketterson, Andrew ; Gao, Xiang ; Guo, Shiping ; Snider, Gregory ; Jena, Debdeep ; Xing, Huili ; Fay, Patrick
Author_Institution :
Dept. of Electr. Eng., Univ. of Notre Dame, Notre Dame, IN, USA
fYear :
2010
fDate :
6-8 Dec. 2010
Abstract :
Monolithically-integrated E- and D-mode InAlN/AlN/GaN HEMTs for mixed-signal applications have been demonstrated. For devices with gate lengths of 144 nm, peak tranconductances of 0.92 S/mm and 0.84 S/mm have been obtained for E- and D-mode devices, respectively, while maximum drain currents of 1.84 A/mm and 1.9 A/mm have been measured for E- and D-mode devices. RF performance is also well-matched, with E-mode devices exhibiting ft´s of 94 GHz and fmax´s of 176 GHz, while D-mode devices had ft´s of 94 GHz and fmax´s of 174 GHz. Ring oscillators have been fabricated to demonstrate the technology.
Keywords :
III-V semiconductors; aluminium compounds; gallium compounds; high electron mobility transistors; indium compounds; HEMT; InAlN-AlN-GaN; frequency 174 GHz; frequency 176 GHz; frequency 94 GHz; mixed-signal application; monolithically-integrated E/D mode; peak tranconductance; ring oscillator; size 144 nm;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting (IEDM), 2010 IEEE International
Conference_Location :
San Francisco, CA
ISSN :
0163-1918
Print_ISBN :
978-1-4424-7418-5
Electronic_ISBN :
0163-1918
Type :
conf
DOI :
10.1109/IEDM.2010.5703451
Filename :
5703451
Link To Document :
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