DocumentCode :
2371413
Title :
50-nm E-mode In0.7Ga0.3As PHEMTs on 100-mm InP substrate with fmax > 1 THz
Author :
Kim, Dae-Hyun ; Alamo, Jesús A del ; Chen, Peter ; Ha, Wonill ; Urteaga, Miguel ; Brar, Berinder
Author_Institution :
Teledyne Sci. Co. (TSC), Thousand Oaks, CA, USA
fYear :
2010
fDate :
6-8 Dec. 2010
Abstract :
We have demonstrated 50-nm enhancement-mode (E-mode) In0.7Ga0.3As PHEMTs with fmax in excess of 1 THz. The devices feature a Pt gate sinking process to effectively thin down the In0.52Al0.48As barrier layer, together with a two-step recess process. The fabricated device with Lg = 50-nm exhibits VT = 0.1 V, gm,max = 1.75 mS/μm, fT = 465 GHz and fmax = 1.06 THz at a moderate value of VDS = 0.75 V. In addition, we have physically modeled the abnormal peaky behavior in Mason´s unilateral gain (Ug) at high values of VDS. A revised small signal model that includes a shunting Rgd-NDR with negative value successfully describes the behavior of the device from 1 to 67 GHz.
Keywords :
III-V semiconductors; gallium compounds; high electron mobility transistors; indium compounds; semiconductor device models; InGaAs; Mason unilateral gain; PHEMT; Pt gate sinking process; enhancement-mode; frequency 1 GHz to 67 GHz; size 50 nm;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting (IEDM), 2010 IEEE International
Conference_Location :
San Francisco, CA
ISSN :
0163-1918
Print_ISBN :
978-1-4424-7418-5
Electronic_ISBN :
0163-1918
Type :
conf
DOI :
10.1109/IEDM.2010.5703453
Filename :
5703453
Link To Document :
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