DocumentCode
2371663
Title
GaAs: Gap state passivation at interfaces and surfaces
Author
Robertson, J. ; Lin, L.
Author_Institution
Eng. Dept, Cambridge Univ., Cambridge, UK
fYear
2010
fDate
6-8 Dec. 2010
Abstract
Electronic structure calculations on surface, interface and defect configurations of GaAs describe passivation of gap states within the electron counting rule. We find that the critical defects are As-As dimers, which follow chemical trends and give gap states at GaAs-oxide interfaces because they are 4-fold not 3-fold coordinated as they are on surfaces. GaAs interface defects cannot easily be passivated independently.
Keywords
III-V semiconductors; electronic structure; energy gap; gallium arsenide; interface states; passivation; surface states; As-As dimers; GaAs; GaAs interface defects; GaAs-oxide interfaces; chemical trends; critical defects; defect configuration; electron counting rule; electronic structure calculations; gap state passivation; interface configuration; surface configuration;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting (IEDM), 2010 IEEE International
Conference_Location
San Francisco, CA
ISSN
0163-1918
Print_ISBN
978-1-4424-7418-5
Electronic_ISBN
0163-1918
Type
conf
DOI
10.1109/IEDM.2010.5703466
Filename
5703466
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