• DocumentCode
    2371663
  • Title

    GaAs: Gap state passivation at interfaces and surfaces

  • Author

    Robertson, J. ; Lin, L.

  • Author_Institution
    Eng. Dept, Cambridge Univ., Cambridge, UK
  • fYear
    2010
  • fDate
    6-8 Dec. 2010
  • Abstract
    Electronic structure calculations on surface, interface and defect configurations of GaAs describe passivation of gap states within the electron counting rule. We find that the critical defects are As-As dimers, which follow chemical trends and give gap states at GaAs-oxide interfaces because they are 4-fold not 3-fold coordinated as they are on surfaces. GaAs interface defects cannot easily be passivated independently.
  • Keywords
    III-V semiconductors; electronic structure; energy gap; gallium arsenide; interface states; passivation; surface states; As-As dimers; GaAs; GaAs interface defects; GaAs-oxide interfaces; chemical trends; critical defects; defect configuration; electron counting rule; electronic structure calculations; gap state passivation; interface configuration; surface configuration;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting (IEDM), 2010 IEEE International
  • Conference_Location
    San Francisco, CA
  • ISSN
    0163-1918
  • Print_ISBN
    978-1-4424-7418-5
  • Electronic_ISBN
    0163-1918
  • Type

    conf

  • DOI
    10.1109/IEDM.2010.5703466
  • Filename
    5703466