Test chip fabrication with extreme ultraviolet lithography for high-volume manufacturing

Since launching the project to get extreme ultraviolet lithography (EUVL) ready for production, we focused on two issues: test chip fabrication down to a half pitch (hp) of 28 nm to assess an applicability of EUVL to the fabrication of logic devices (BEOL test chip); and the manufacturability of EUVL, for which we used a special PL test site to assess the electrical yield. Furthermore, we examined the potential of EUVL for device fabrication at sizes beyond hp 24 nm.