DocumentCode :
2373445
Title :
RF B-field effects in inductive plasma sources
Author :
Cohen, R.H. ; Rognlien, T.D.
Author_Institution :
Lawrence Livermore Nat. Lab., CA, USA
fYear :
1995
fDate :
5-8 June 1995
Firstpage :
248
Abstract :
Summary form only given. For inductive plasma sources, the RF electric field E/sub rf/ decays going into the plasma owing to the skin effect and finite geometry. This short scale length gives rise to a strong RF magnetic field B/sub rf//spl prop/1/f, where f is the RF frequency. The resulting qv/spl times/B/sub rf/ force for electrons typically exceeds the qE/sub rf/ force for f/spl les/14 MHz. In the linear regime (/spl nu//sub rf//spl Lt//spl nu//sub thermal/), the magnitude of the collisionless (or stochastic) heating for an isotropic distribution is not changed by B/sub rf/, but it does cause the energy to be deposited primarily in the velocity component along E/sub rf//spl times/B/sub rf/ rather than along E/sub rf/. In the nonlinear regime, B/sub rf/ can stop most of the electrons before they reach the wall sheath, with an effect that is qualitatively like a ponderomotive potential. Here the collisionless heating level is reduced below that predicted from linear theory. Analytical results are given for the for the nonlinear regime when the transit time is either small or large compared to the wave period, and linear regime with arbitrary transit time, and compared to numerical results. Numerical results with a self-consistent DC potential show improved plasma uniformity, as expected from the ponderomotive-like effect. Collisions in the field region can modify these results; this is explored numerically by adding a model for pitch-angle scattering.
Keywords :
high-frequency discharges; plasma collision processes; plasma heating; plasma production; sputter etching; 14 MHz; RF B-field effects; RF electric field; collisionless heating level; finite geometry; inductive plasma sources; linear regime; nonlinear regime; pitch-angle scattering; ponderomotive-like effect; self-consistent DC potential; short scale length; skin effect; Electrons; Geometry; Heating; Magnetic fields; Plasma sources; Plasma waves; Radio frequency; Scattering; Skin effect; Stochastic processes;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1995. IEEE Conference Record - Abstracts., 1995 IEEE International Conference on
Conference_Location :
Madison, WI, USA
ISSN :
0730-9244
Print_ISBN :
0-7803-2669-5
Type :
conf
DOI :
10.1109/PLASMA.1995.533246
Filename :
533246
Link To Document :
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