• DocumentCode
    2373622
  • Title

    High Current Density Advanced Cold Cathode Experiments

  • Author

    He, Xin ; Valahos, Vasilios ; Scharer, John ; Booske, John ; Sengele, Sean ; Miller, Ryan ; Jordan, Nick ; Gilgenbach, Ron

  • Author_Institution
    Wisconsin Univ.
  • fYear
    0
  • fDate
    0-0 0
  • Firstpage
    477
  • Lastpage
    478
  • Abstract
    We report the design, construction and initial operation of an advanced, high-current-density, field emission cathode facility. The facility is designed to examine the nanophysics of field emission from advanced Al, Ni, C, CsI, Mo, and other material cathodes that operate in the 1-1000 A/cm2 regime. Operation is designed for UHV vacuum (10-10 Torr) with bake-out provisions up to temperatures of 450 C for several days to eliminate any residual water vapor or other contaminants. Three pumps are used to achieve UHV vacuum. The first is a Varian scroll pump, working from atmospheric pressure to 10-3 Torr. Then, a Varian turbo pump is used to reduce the pressure from -3 Torr to-8 Torr, with an all-metal bakeable right 90-degree angle valve to cut off the turbo pump from the whole system after pumping. Finally, a 250L/S, VacIon pump brings the whole system to -8 Torr with 450 C baking
  • Keywords
    aluminium; caesium; carbon; cold-cathode tubes; current density; field emission; molybdenum; nickel; 450 C; Al; C; CsI; Mo; Ni; UHV vacuum; VacIon pump; Varian scroll pump; Varian turbo pump; atmospheric pressure; cold cathode experiments; field emission nanophysics; high current density; water vapor; Anodes; Cathodes; Current density; Current-voltage characteristics; Feeds; Plasma measurements; Plasma temperature; Pollution measurement; Temperature measurement; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Electronics Conference, 2006 held Jointly with 2006 IEEE International Vacuum Electron Sources., IEEE International
  • Conference_Location
    Monterey, CA
  • Print_ISBN
    1-4244-0108-9
  • Type

    conf

  • DOI
    10.1109/IVELEC.2006.1666390
  • Filename
    1666390