DocumentCode :
2373985
Title :
Simulations of a triode system with an internal grid
Author :
Vahedi, V. ; Bardsley, J.N. ; DiPeso, G.
Author_Institution :
Lawrence Livermore Nat. Lab., CA, USA
fYear :
1995
fDate :
5-8 June 1995
Firstpage :
249
Abstract :
Summary form only given. The 2D particle-in-cell code PDP2 has been modified to include internal structures for modeling a triode system with an internal grounded grid. The triode system includes one or two driven electrodes, an internal grounded grid and grounded walls. The wafer is placed on a driven electrode and biased to extract ions from the plasma. Ion impact secondary electron emission from the walls and the grid is also included in order to allow for possible hollow cathode effects. In our simulations, we only bias the target electrode and ground the other electrode. We use argon as the background gas at pressures of 20-50 mTorr. The external RF voltage source is set to be near 1 kV, and the target bias voltage is obtained self-consistently to be near the RF voltage. We investigate the plasma with and without the grid and the secondary electrons to understand their role in plasma creation, ion flux uniformity and resulting ion energy distribution at the biased target. We also vary the grid spacing and location to find the optimum plasma density and ion flux uniformity.
Keywords :
high-frequency discharges; plasma density; plasma simulation; plasma-wall interactions; secondary electron emission; sputtering; triodes; 1 kV; 20 to 50 mtorr; 2D particle-in-cell code; Ar; PDP2; driven electrodes; external RF voltage; grounded grid; hollow cathode effects; internal grid; ion energy distribution; ion flux uniformity; ion impact secondary electron emission; optimum plasma density; plasma creation; target bias voltage; triode system; walls; Argon; Cathodes; Electrodes; Electron emission; Plasma density; Plasma simulation; Plasma sources; Radio frequency; Semiconductor device modeling; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1995. IEEE Conference Record - Abstracts., 1995 IEEE International Conference on
Conference_Location :
Madison, WI, USA
ISSN :
0730-9244
Print_ISBN :
0-7803-2669-5
Type :
conf
DOI :
10.1109/PLASMA.1995.533249
Filename :
533249
Link To Document :
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