DocumentCode :
2373986
Title :
Gate-substrated Structure to Improve FED Performance
Author :
Wei, Gu ; Wei, Lei ; Xiaobing, Zhang
Author_Institution :
Dept. of Electron. Eng., Southeast Univ.
fYear :
0
fDate :
0-0 0
Firstpage :
515
Lastpage :
516
Abstract :
A combined circuit model of both outer driving circuit and inner circuit is given for mode FED, normal structured or gate-substrated. Based on the model, anode voltage´s effect on gate voltage is analyzed. Charging effect on driving signal may affect grayscale of figures. A structure is suggested to reduce such effect
Keywords :
driver circuits; field emission displays; FED performance; anode voltage effect; charging effect; combined circuit model; driving signal; gate voltage; gate-substrated structure; inner driving circuit; outer driving circuit; Anodes; Capacitors; Cathodes; Circuits; Dielectrics and electrical insulation; Electrodes; Gray-scale; Manufacturing; Pulse width modulation; Voltage; FED; charging effect; circuit model;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Electronics Conference, 2006 held Jointly with 2006 IEEE International Vacuum Electron Sources., IEEE International
Conference_Location :
Monterey, CA
Print_ISBN :
1-4244-0108-9
Type :
conf
DOI :
10.1109/IVELEC.2006.1666409
Filename :
1666409
Link To Document :
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