DocumentCode :
2374197
Title :
Thermoluminescence (TL) related to [SiO4/M]° defects (M = Li or Na) in quartz
Author :
Halperin, A.
Author_Institution :
Racah Inst. of Phys., Hebrew Univ., Jerusalem, Israel
fYear :
1993
fDate :
2-4 Jun 1993
Firstpage :
420
Lastpage :
426
Abstract :
The dose dependence of the 190 and 200 K TL peaks of Al-Li and Al-Na containing quartz (TL(M), M = Li or Na) is described. The TL(M) peaks were excited by two X-irradiations at 80 K with warming to 250 K between the two irradiations. The dose dependence was examined separately as a function of the time of the first irradiation (t1 ) and of the second irradiation (t2). Slopes between 0 and 1.15 were obtained, depending on thermal and radiation pretreatments of the samples. The variations in slope are shown to be related to the filling of deeper traps competing with the [SiO4M]+ traps related to the TL(M) peaks. A first irradiation of only 2 s was found to release M-ions and produce [SiO4/M]+ electron traps at a concentration which took about one hour of the second irradiation to fill them. With all competing traps stable at 250 K full, and keeping t1 constant, the dependence of TL(M) on t2 started with a slope of 1.0. The curves then reached a maximum near t2 = 1500 s and decreased for longer t2 values. This decrease gives support to a hypothesis according to which many M-ions get trapped at unidentified Xi defects during long irradiations, and are lost for the production of TL(M)
Keywords :
X-ray effects; defect states; electron traps; lithium; piezoelectric materials; quartz; sodium; thermoluminescence; 1500 sec; 190 K; 2 sec; 200 K; 250 K; 80 K; SiO2:Al,Li; SiO2:Al,Na; TL peaks; X-ray irradiation; dose dependence; electron traps; radiation pretreatments; thermal pretreatment; Aluminum; Charge carrier processes; Electron traps; Filling; Impurities; Luminescence; Physics; Production; Silicon; Temperature distribution;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Frequency Control Symposium, 1993. 47th., Proceedings of the 1993 IEEE International
Conference_Location :
Salt Lake City, UT
Print_ISBN :
0-7803-0905-7
Type :
conf
DOI :
10.1109/FREQ.1993.367428
Filename :
367428
Link To Document :
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