• DocumentCode
    2374603
  • Title

    Numerical modeling of electrostatic spray

  • Author

    Okuda, Haruhisa ; Kelly, A.J.

  • Author_Institution
    Plasma Phys. Lab., Princeton Univ., NJ, USA
  • fYear
    1995
  • fDate
    5-8 June 1995
  • Firstpage
    250
  • Abstract
    Summary form only given, as follows. Electrostatic powder painting in which aerosolized paint particles are charged up by an electron beam injected into air has been shown to be very promising in many applications including automobile painting. Behavior of low energy electrons (/spl sim/10 keV) interacting with air and powder particles at one atmospheric pressure, however, is not well understood and the detailed information of the interaction is essential in designing commercial paint spray. In order to understand the above process, we will use a three-dimensional electrostatic particle simulation model in which an electron beam is injected into the air. Various ionization processes are included in the model by means of Monte-Carlo method. Preliminary results of the simulations indicate that a beam electron can generate a few hundred secondary electrons as well as negative ions that are important in charging the paint powder. Results of the simulations will be presented and compared with data available from the powder spray experiment.
  • Keywords
    Monte Carlo methods; aerosols; electron beam applications; particle beam injection; powder technology; simulation; spray coating techniques; sprays; 1 atm; 10 keV; Monte-Carlo method; aerosolized paint particles; automobile painting; commercial paint spray; electron beam injection; electrostatic powder painting; electrostatic spray; ionization processes; low energy electrons; numerical modeling; three-dimensional electrostatic particle simulation model; Atmospheric modeling; Automobiles; Electron beams; Electrostatics; Ionization; Numerical models; Painting; Paints; Powders; Spraying;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1995. IEEE Conference Record - Abstracts., 1995 IEEE International Conference on
  • Conference_Location
    Madison, WI, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-2669-5
  • Type

    conf

  • DOI
    10.1109/PLASMA.1995.533252
  • Filename
    533252