• DocumentCode
    2374857
  • Title

    Design, fabrication and performance of 2 GHz surface transverse wave resonators

  • Author

    Denisenko, Sergey ; Avramov, I.D.

  • Author_Institution
    Inst. of Semicond. Phys., Novosibirsk, Russia
  • fYear
    1993
  • fDate
    2-4 Jun 1993
  • Firstpage
    645
  • Lastpage
    649
  • Abstract
    The authors present results from 2-GHz surface-transverse-wave (STW) resonant devices fabricated with a linewidth of 0.6 μm which is considered to be the upper limit at which reproducible linewidths are obtained with conventional photolithography. Extended cavity single-mode STW resonators with an insertion loss of 10 dB and a record value of 3800 for unloaded Q, low-loss, low-Q resonators and two-pole resonator filters for voltage-controlled oscillators with a tuning range of up to 0.1% of the resonant frequency were designed, fabricated, and tested. The device was realized with the ZBA-21S electron beam lithography system, using a direct-write process. The device characteristics show that STWs are ideally suited for low-cost fabrication of high-performance resonant devices with insertion losses well below 10 dB at 2 GHz on temperature-stable quartz substrates
  • Keywords
    Q-factor; UHF filters; acoustic microwave devices; electron beam lithography; losses; quartz; surface acoustic wave resonator filters; surface acoustic wave resonators; 10 dB; 2 GHz; SiO2; ZBA-21S electron beam lithography system; direct-write process; extended cavity single mode STW resonators; insertion loss; low-Q resonators; photolithography; resonant frequency; surface transverse wave resonators; temperature-stable quartz substrates; two-pole resonator filters; voltage-controlled oscillators; Electron beams; Fabrication; Insertion loss; Lithography; Resonance; Resonant frequency; Resonator filters; Testing; Tuning; Voltage-controlled oscillators;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Frequency Control Symposium, 1993. 47th., Proceedings of the 1993 IEEE International
  • Conference_Location
    Salt Lake City, UT
  • Print_ISBN
    0-7803-0905-7
  • Type

    conf

  • DOI
    10.1109/FREQ.1993.367456
  • Filename
    367456