• DocumentCode
    2376423
  • Title

    A parametric study of power MOSFETs

  • Author

    Hu, Chenming

  • Author_Institution
    Department of Electrical Engineering and Computer Sciences, University of California, Berkeley, California, 94720
  • fYear
    1979
  • fDate
    18-22 June 1979
  • Firstpage
    385
  • Lastpage
    395
  • Abstract
    The theoretical limitations of V-grooved and double-diffused power MOSFETs are studied using several design parameters as variables. The results are used to gauge the performance of currently available power MOSFETs and to project the capabilities of future devices. With proper design, the channel resistance can be negligible so that the on-state resistance is that of the bulk material (~8.3xl0-9 VdsB 2.5 ??.cm2) plus the lead resistance. A transmission line effect associated with long resistive gate electrodes could limit the speed of certain devices. Devices with the capability of switching 10 kW per cm2 of chip area and hundred kilowatt per package are theoretically possible over a very wide voltage range. A new structure is proposed that could raise the power capability by an order of magnitude in very high voltage devices.
  • Keywords
    Electric breakdown; Electrodes; Junctions; Logic gates; MOSFET; Resistance; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Power Electronics Specialists Conference, 1979 IEEE
  • Conference_Location
    San Diego, CA, USA
  • ISSN
    0275-9306
  • Type

    conf

  • DOI
    10.1109/PESC.1979.7081051
  • Filename
    7081051