DocumentCode :
2376423
Title :
A parametric study of power MOSFETs
Author :
Hu, Chenming
Author_Institution :
Department of Electrical Engineering and Computer Sciences, University of California, Berkeley, California, 94720
fYear :
1979
fDate :
18-22 June 1979
Firstpage :
385
Lastpage :
395
Abstract :
The theoretical limitations of V-grooved and double-diffused power MOSFETs are studied using several design parameters as variables. The results are used to gauge the performance of currently available power MOSFETs and to project the capabilities of future devices. With proper design, the channel resistance can be negligible so that the on-state resistance is that of the bulk material (~8.3xl0-9 VdsB 2.5 ??.cm2) plus the lead resistance. A transmission line effect associated with long resistive gate electrodes could limit the speed of certain devices. Devices with the capability of switching 10 kW per cm2 of chip area and hundred kilowatt per package are theoretically possible over a very wide voltage range. A new structure is proposed that could raise the power capability by an order of magnitude in very high voltage devices.
Keywords :
Electric breakdown; Electrodes; Junctions; Logic gates; MOSFET; Resistance; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Power Electronics Specialists Conference, 1979 IEEE
Conference_Location :
San Diego, CA, USA
ISSN :
0275-9306
Type :
conf
DOI :
10.1109/PESC.1979.7081051
Filename :
7081051
Link To Document :
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