DocumentCode
2376423
Title
A parametric study of power MOSFETs
Author
Hu, Chenming
Author_Institution
Department of Electrical Engineering and Computer Sciences, University of California, Berkeley, California, 94720
fYear
1979
fDate
18-22 June 1979
Firstpage
385
Lastpage
395
Abstract
The theoretical limitations of V-grooved and double-diffused power MOSFETs are studied using several design parameters as variables. The results are used to gauge the performance of currently available power MOSFETs and to project the capabilities of future devices. With proper design, the channel resistance can be negligible so that the on-state resistance is that of the bulk material (~8.3xl0-9 VdsB 2.5 ??.cm2) plus the lead resistance. A transmission line effect associated with long resistive gate electrodes could limit the speed of certain devices. Devices with the capability of switching 10 kW per cm2 of chip area and hundred kilowatt per package are theoretically possible over a very wide voltage range. A new structure is proposed that could raise the power capability by an order of magnitude in very high voltage devices.
Keywords
Electric breakdown; Electrodes; Junctions; Logic gates; MOSFET; Resistance; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Power Electronics Specialists Conference, 1979 IEEE
Conference_Location
San Diego, CA, USA
ISSN
0275-9306
Type
conf
DOI
10.1109/PESC.1979.7081051
Filename
7081051
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