DocumentCode :
2376793
Title :
Theory of enhanced kilovolt radiation from mixtures of elements of atomic numbers 11-14
Author :
Apruzese, J.P. ; Thornhill, J.W. ; Whitney, K.G. ; Davis, J. ; Riordan, J.C. ; Deeney, C. ; LePell, P.D. ; Failor, B.H. ; Wong, S.L.
Author_Institution :
Div. of Plasma Phys., Naval Res. Lab., Washington, DC, USA
fYear :
1995
fDate :
5-8 June 1995
Firstpage :
255
Abstract :
Summary form only given, as follows. A decade ago it was shown that the K shell emissivity of a Z pinch plasma can be significantly enhanced over that of a single element plasma when an element of nearby atomic number is mixed with the one and the line opacity is reduced. Recent experiments at Physics International Co. have shown that this enhanced emissivity resulted in actual yield increases when Al wires were coated with Mg and driven on a 4-MA generator. An additional feature appeared: the Mg coating imploded prior to the Al and was driven to hotter temperatures. In the present work we examine Na, Mg, Al, and Si with respect to both types of radiation-enhancing effects. The first effect referred to is the reduced line opacity when several elements are employed in a Z pinch, keeping the plasma mass the same as that which would be used for one element on the same generator. The second of these effects is the tailoring of the temperature distribution of the plasma to make each element light up as close as possible to its most effective radiating temperature. Detailed static and hydrodynamic calculations show that significant further yield enhancements are achievable.
Keywords :
Z pinch; emissivity; exploding wires; opacity; plasma diagnostics; plasma properties; plasma temperature; temperature; temperature distribution; 4 MA; Al; Al wires; Al-Mg; K shell emissivity; Mg; Na; Si; Z pinch plasma; enhanced emissivity; enhanced kilovolt radiation; hydrodynamic calculations; line opacity; plasma mass; radiating temperature; radiation-enhancing effects; reduced line opacity; single element plasma; static calculations; temperature distribution; yield enhancements; Artificial intelligence; Atomic measurements; Hydrodynamics; Inductance; Laboratories; Physics; Plasma temperature; Switches; Temperature distribution; Wire;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1995. IEEE Conference Record - Abstracts., 1995 IEEE International Conference on
Conference_Location :
Madison, WI, USA
ISSN :
0730-9244
Print_ISBN :
0-7803-2669-5
Type :
conf
DOI :
10.1109/PLASMA.1995.533263
Filename :
533263
Link To Document :
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