• DocumentCode
    2378872
  • Title

    Si Tunneling Field Effect Transistor with Tunnelling In-Line with the Gate Field

  • Author

    Fischer, I.A. ; Hähnel, D. ; Isemann, H. ; Kottantharayil, A. ; Murali, G. ; Oehme, M. ; Schulze, J.

  • Author_Institution
    Inst. for Semicond. Eng., Univ. of Stuttgart, Stuttgart, Germany
  • fYear
    2012
  • fDate
    4-6 June 2012
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    As scaling of complementary metal-oxide-semiconductor (CMOS) technology approaches its end, new device concepts are intensively being explored. The tunneling field effect transistor (TFET) is a device proposal that has the potential to outperform CMOS technology both in energy efficiency and speed. This concept, however, has to be improved in such a way that on-currents ION are raised to meet industry requirements while maintaining low off-currents IOFF as well as achieving a subthreshold swing that is below the CMOS limit of 60 mV/dec.
  • Keywords
    MOSFET; elemental semiconductors; silicon; tunnelling; CMOS technology; Gate Field; Si; TFET; Tunnelling In-Line; complementary metal-oxide-semiconductor technology; energy efficiency; low off-current; tunneling field effect transistor; CMOS integrated circuits; Doping; Etching; FETs; Logic gates; Silicon; Tunneling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Silicon-Germanium Technology and Device Meeting (ISTDM), 2012 International
  • Conference_Location
    Berkeley, CA
  • Print_ISBN
    978-1-4577-1864-9
  • Electronic_ISBN
    978-1-4577-1863-2
  • Type

    conf

  • DOI
    10.1109/ISTDM.2012.6222411
  • Filename
    6222411