DocumentCode
2380128
Title
Is there always performance overhead for regular fabric?
Author
Yi-Wei Lin ; Marek-Sadowska, M. ; Maly, W. ; Pfitzner, A. ; Kasprowicz, D.
fYear
2008
fDate
12-15 Oct. 2008
Firstpage
557
Lastpage
562
Abstract
In this paper, we study the circuits built from super-regular, high-density transistor arrays that can be prefabricated and customized using an OPC-free interconnect manufacturing process. The super-regular layout style greatly enhances the chippsilas manufacturability. Unlike other regular fabrics that sacrifice area and performance to improve regularity, the new layout style, combined with a new 3-D geometry transistor, enables to produce circuits with timing and power density comparable to or better than that of conventional CMOS circuits and using less chip area.
Keywords
field effect transistor circuits; integrated circuit interconnections; integrated circuit layout; integrated circuit manufacture; photolithography; proximity effect (lithography); 3-D geometry transistor; OPC-free interconnect manufacturing process; VeSFET; chip manufacturability; high-density transistor arrays; integrated circuit fabrication; optical proximity correction; photo-lithographiy; power density; super-regular layout style; vertical slit field effect transistor circuits; CMOS technology; Capacitance; FETs; Fabrics; Geometry; Integrated circuit interconnections; Libraries; MOSFETs; Manufacturing processes; Timing;
fLanguage
English
Publisher
ieee
Conference_Titel
Computer Design, 2008. ICCD 2008. IEEE International Conference on
Conference_Location
Lake Tahoe, CA
ISSN
1063-6404
Print_ISBN
978-1-4244-2657-7
Type
conf
DOI
10.1109/ICCD.2008.4751916
Filename
4751916
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