Title :
Challenges in detecting and analyzing process-induced damage for 130nm CMOS technology and beyond [Title only-no paper published pgs 31-36]
Keywords :
CMOS process; CMOS technology;
Conference_Titel :
Plasma- and Process-Induced Damage, 2002 7th International Symposium on
Print_ISBN :
0-9651577-7-6
DOI :
10.1109/PPID.2002.1042602
