DocumentCode :
2380479
Title :
Thermal conductivity and softening of gate oxide breakdown
Author :
Ko, Chin-Yuan ; Liao, P.J. ; Shih, J.R. ; Wang, J.J. ; Peng, Y.K. ; Yue, J.
Author_Institution :
Taiwan Semicond. Manuf. Co., Hsin-Chu, Taiwan
fYear :
2002
fDate :
2002
Firstpage :
60
Lastpage :
63
Abstract :
The TDDB under accumulation and inversion mode was investigated. It is shown that the generation probability of soft breakdown dramatically increases with the stress mode changing from accumulation to inversion. In the accumulation stress mode, there exists a depletion region serving as a thermal barrier; however, in the inversion mode, better thermal conduction induces larger temperature gradient, which causes higher channel current due to the Seebeck effect. Based on the above concept, we develop a modified ramp voltage test which can detect soft defects which can´t be detected by the conventional ramp voltage test.
Keywords :
Seebeck effect; accumulation layers; electric breakdown; inversion layers; thermal conductivity; Seebeck effect; TDDB; accumulation mode; accumulation stress mode; channel current; depletion region; gate oxide breakdown; generation probability; inversion mode; modified ramp voltage test; soft breakdown; softening; stress mode; temperature gradient; thermal barrier; thermal conduction; thermal conductivity; Breakdown voltage; Capacitors; Current measurement; Dielectric breakdown; Electric breakdown; MOS devices; Softening; Testing; Thermal conductivity; Thermal stresses;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma- and Process-Induced Damage, 2002 7th International Symposium on
Print_ISBN :
0-9651577-7-6
Type :
conf
DOI :
10.1109/PPID.2002.1042609
Filename :
1042609
Link To Document :
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