DocumentCode :
2380494
Title :
Diagnostics of plasma process induced failure on analog device´s mismatch characteristics
Author :
Shih, J.R. ; Huang, Anney ; Chinn, Y.H. ; Chin, C.C. ; Peng, Yeng ; Yue, J.T.
Author_Institution :
Taiwan Semiconductor Manufacturing Cowpany
fYear :
2002
fDate :
5-7 June 2002
Firstpage :
64
Lastpage :
67
Keywords :
Analog circuits; Antenna measurements; Leakage current; MOSFET circuits; Plasma applications; Plasma devices; Plasma diagnostics; Plasma measurements; Plasma properties; Protection;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma- and Process-Induced Damage, 2002 7th International Symposium on
Conference_Location :
Maui, HI, USA
Print_ISBN :
0-9651577-7-6
Type :
conf
DOI :
10.1109/PPID.2002.1042610
Filename :
1042610
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2380494
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