Title :
Glow Characterization of Octafluorocyclobutane RF Plasmas
Author :
Chun Huang ; Yan-Ren Wang ; Wei-Chun Ma ; Ching-Yuan Tsai
Author_Institution :
Dept. of Chem. Eng. & Mater. Sci., Yuan Ze Univ., Chungli, Taiwan
Abstract :
The glow characteristics and optical emission features of octafluorocyclobutane radio frequency plasmas with various gas flow rates were investigated. The plasma glow was characterized by optical photography and optical emission spectroscopy. The glow differences were attributed to the nature of the luminous gas phase with respect to polymer-forming species and etching species.
Keywords :
glow discharges; high-frequency discharges; plasma diagnostics; plasma materials processing; polymers; sputter etching; etching species; gas flow rates; luminous gas phase; octafluorocyclobutane RF plasmas; optical emission spectroscopy; optical photography; plasma glow characterization; polymer-forming species; radiofrequency plasmas; Biomedical optical imaging; Color; Optical polymers; Plasmas; Radio frequency; Stimulated emission; Plasma applications; plasma devices; plasma devices.;
Journal_Title :
Plasma Science, IEEE Transactions on
DOI :
10.1109/TPS.2014.2323405
