DocumentCode :
2381505
Title :
MoS2 thin films deposited by RF magnetron sputtering
Author :
Kim, Sun Kyu ; Ahn, Young Hwan
Author_Institution :
Sch. of Mater. & Metall. Eng., Ulsan Univ., South Korea
Volume :
3
fYear :
2000
fDate :
2000
Firstpage :
362
Abstract :
Molybdeum disulfide (MoS2) is a widely used solid lubricant material for space and bearing applications. In this study, the deposition of MoS2 thin films by RF magnetron sputtering was studied with regard to the microstructural change and mechanical properties. The coating parameters, such as working pressure, RF power, substrate temperature, and bias voltage, were varied to determine how these parameters affected the film morphology and mechanical properties of the deposited films. The best wear properties and critical load were observed with the film deposited at 70°C. The critical load increased with increase of sputter etching time
Keywords :
adhesion; lubrication; molybdenum compounds; sliding friction; sputter deposition; sputtered coatings; wear resistance; wear resistant coatings; 70 C; MoS2; RF magnetron sputtering; RF power; adhesion; bias voltage; coating parameters; critical load; film morphology; friction coefficient; mechanical properties; microstructural change; solid lubricant; sputter etching time; substrate temperature; thin film deposition; wear properties; working pressure; Coatings; Lubricants; Magnetic levitation; Magnetic materials; Mechanical factors; Radio frequency; Solids; Sputtering; Substrates; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Science and Technology, 2000. KORUS 2000. Proceedings. The 4th Korea-Russia International Symposium on
Conference_Location :
Ulsan
Print_ISBN :
0-7803-6486-4
Type :
conf
DOI :
10.1109/KORUS.2000.866115
Filename :
866115
Link To Document :
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