DocumentCode
2381505
Title
MoS2 thin films deposited by RF magnetron sputtering
Author
Kim, Sun Kyu ; Ahn, Young Hwan
Author_Institution
Sch. of Mater. & Metall. Eng., Ulsan Univ., South Korea
Volume
3
fYear
2000
fDate
2000
Firstpage
362
Abstract
Molybdeum disulfide (MoS2) is a widely used solid lubricant material for space and bearing applications. In this study, the deposition of MoS2 thin films by RF magnetron sputtering was studied with regard to the microstructural change and mechanical properties. The coating parameters, such as working pressure, RF power, substrate temperature, and bias voltage, were varied to determine how these parameters affected the film morphology and mechanical properties of the deposited films. The best wear properties and critical load were observed with the film deposited at 70°C. The critical load increased with increase of sputter etching time
Keywords
adhesion; lubrication; molybdenum compounds; sliding friction; sputter deposition; sputtered coatings; wear resistance; wear resistant coatings; 70 C; MoS2; RF magnetron sputtering; RF power; adhesion; bias voltage; coating parameters; critical load; film morphology; friction coefficient; mechanical properties; microstructural change; solid lubricant; sputter etching time; substrate temperature; thin film deposition; wear properties; working pressure; Coatings; Lubricants; Magnetic levitation; Magnetic materials; Mechanical factors; Radio frequency; Solids; Sputtering; Substrates; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Science and Technology, 2000. KORUS 2000. Proceedings. The 4th Korea-Russia International Symposium on
Conference_Location
Ulsan
Print_ISBN
0-7803-6486-4
Type
conf
DOI
10.1109/KORUS.2000.866115
Filename
866115
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