• DocumentCode
    2381505
  • Title

    MoS2 thin films deposited by RF magnetron sputtering

  • Author

    Kim, Sun Kyu ; Ahn, Young Hwan

  • Author_Institution
    Sch. of Mater. & Metall. Eng., Ulsan Univ., South Korea
  • Volume
    3
  • fYear
    2000
  • fDate
    2000
  • Firstpage
    362
  • Abstract
    Molybdeum disulfide (MoS2) is a widely used solid lubricant material for space and bearing applications. In this study, the deposition of MoS2 thin films by RF magnetron sputtering was studied with regard to the microstructural change and mechanical properties. The coating parameters, such as working pressure, RF power, substrate temperature, and bias voltage, were varied to determine how these parameters affected the film morphology and mechanical properties of the deposited films. The best wear properties and critical load were observed with the film deposited at 70°C. The critical load increased with increase of sputter etching time
  • Keywords
    adhesion; lubrication; molybdenum compounds; sliding friction; sputter deposition; sputtered coatings; wear resistance; wear resistant coatings; 70 C; MoS2; RF magnetron sputtering; RF power; adhesion; bias voltage; coating parameters; critical load; film morphology; friction coefficient; mechanical properties; microstructural change; solid lubricant; sputter etching time; substrate temperature; thin film deposition; wear properties; working pressure; Coatings; Lubricants; Magnetic levitation; Magnetic materials; Mechanical factors; Radio frequency; Solids; Sputtering; Substrates; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Science and Technology, 2000. KORUS 2000. Proceedings. The 4th Korea-Russia International Symposium on
  • Conference_Location
    Ulsan
  • Print_ISBN
    0-7803-6486-4
  • Type

    conf

  • DOI
    10.1109/KORUS.2000.866115
  • Filename
    866115