DocumentCode :
2383311
Title :
Spatial statistics for micro/nanoelectronics and materials science
Author :
Miranda, E. ; Jimé, D. ; Suñ, J. ; O´Connor, E. ; Monaghan, S. ; Cherkaoui, K. ; Hurley, P.K.
Author_Institution :
Dept. d´´Eng. Electron., Univ. Autonoma de Barcelona, Barcelona, Spain
fYear :
2012
fDate :
13-16 May 2012
Firstpage :
23
Lastpage :
30
Abstract :
Spatial statistics is a specialized branch of statistics aimed to provide information about the locations of randomly distributed objects in 1, 2 or 3 dimensions. The analysis involves data exploration, parameter estimation, model fitting and hypothesis formulation. In particular, in this work, we present some recent advances in the characterization of the spatial distribution of breakdown spots over the gate electrode of Metal-Insulator-Semiconductor and Metal-Insulator-Metal structures. The spots are regarded as a two-dimensional point pattern, which is analyzed using intensity plots, spatial counting methods, inter-event distance histograms and functional summary estimators. The methods reported here are general so that they can be applied to many different research fields.
Keywords :
MIM structures; MIS structures; nanoelectronics; parameter estimation; hypothesis formulation; interevent distance histograms; materials science; metal-insulator-metal structures; metal-insulator-semiconductor; microelectronics; model fitting; nanoelectronics; parameter estimation; randomly distributed objects; spatial counting methods; spatial statistics; two-dimensional point pattern; Correlation; Hafnium compounds; Histograms; Indexes; Logic gates; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microelectronics (MIEL), 2012 28th International Conference on
Conference_Location :
Nis
ISSN :
pending
Print_ISBN :
978-1-4673-0237-1
Type :
conf
DOI :
10.1109/MIEL.2012.6222790
Filename :
6222790
Link To Document :
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