DocumentCode :
2383994
Title :
Principal component based k-nearest-neighbor rule for semiconductor process fault detection
Author :
He, Q. Peter ; Wang, Jin
Author_Institution :
Dept. of Chem. Eng., Tuskegee Univ., Tuskegee, AL
fYear :
2008
fDate :
11-13 June 2008
Firstpage :
1606
Lastpage :
1611
Abstract :
Fault detection and classification (FDC) has been recognized in the semiconductor industry as an integral component of advanced process control (APC) framework in improving overall equipment efficiency (OEE). To explicitly account for the unique characteristics of the semiconductor processes, such as nonlinearity in most batch processes, multimodal batch trajectories due to product mix, the fault detection method based on the k-nearest-neighbor rule (FD-kNN) has been developed previously for fault detection in semiconductor manufacturing. However, because FD-kNN does not generate a classifier offline, it is computational and storage intensive, which could make it difficult for online process monitoring. To take the advantages of principal component analysis (PCA) in dimensionality reduction and FD-kNN in nonlinearity and multimode handling, a principal component based kNN (PC- kNN) is proposed. Two simulated examples and an industrial example are used to demonstrate the performance of the proposed PC-kNN method in fault detection.
Keywords :
batch processing (industrial); data reduction; electron device manufacture; fault diagnosis; pattern classification; principal component analysis; process control; advanced process control framework; batch processes; dimensionality reduction; fault classification; k-nearest-neighbor rule; multimodal batch trajectories; multimode handling; overall equipment efficiency; principal component analysis; principal component based kNN; semiconductor industry; semiconductor manufacturing; semiconductor process fault detection; Chemical engineering; Covariance matrix; Electronics industry; Fault detection; Manufacturing processes; Matrix decomposition; Monitoring; Principal component analysis; Process control; Semiconductor process modeling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
American Control Conference, 2008
Conference_Location :
Seattle, WA
ISSN :
0743-1619
Print_ISBN :
978-1-4244-2078-0
Electronic_ISBN :
0743-1619
Type :
conf
DOI :
10.1109/ACC.2008.4586721
Filename :
4586721
Link To Document :
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