Title :
Micromachined silicon subminiature microphones with piezoelectric P(VDF/TRFE)-layers and silicon-nitride-membranes
Author :
Schellin, R. ; Heß, G. ; Kreßmann, R. ; Waßmuth, P.
Author_Institution :
Inst. for Telecommun. & Electroacoust., Tech. Univ. of Darmstadt, Germany
Abstract :
In this paper a silicon subminiature microphone is described, which is based on the piezoelectric effect of spin-coated P(VDF/TrFE)-layers. The polymer layers are placed on top of a very thin silicon nitride membrane, which is implanted with boron ions in order to reduce the tensile stress of the diaphragm, resulting in higher microphone sensitivities. A maximum sensitivity of 150 μV/Pa, a bandwidth of about 16 kHz and an equivalent noise level of less than 60 dB(A) were measured. Considering the small area of the membrane of the microphone (1 mm2), the sensors show a much better performance than former microphones with piezoelectric polymer layers
Keywords :
boron; micromachining; microphones; piezoelectric transducers; polymer films; silicon; silicon compounds; 16 kHz; 60 dB; Si-Si3N4:B; Si3N4:B membranes; bandwidth; equivalent noise level; higher microphone sensitivities; maximum sensitivity; micromachined Si subminiature microphones; piezoelectric P(VDF/TRFE)-layers; tensile stress; Bandwidth; Biomembranes; Boron; Microphones; Noise level; Noise measurement; Piezoelectric effect; Polymers; Silicon; Tensile stress;
Conference_Titel :
Electrets, 1994. (ISE 8), 8th International Symposium on
Conference_Location :
Paris
Print_ISBN :
0-7803-1940-0
DOI :
10.1109/ISE.1994.515262