DocumentCode
2384689
Title
Micromachined silicon subminiature microphones with piezoelectric P(VDF/TRFE)-layers and silicon-nitride-membranes
Author
Schellin, R. ; Heß, G. ; Kreßmann, R. ; Waßmuth, P.
Author_Institution
Inst. for Telecommun. & Electroacoust., Tech. Univ. of Darmstadt, Germany
fYear
1994
fDate
7-9 Sep 1994
Firstpage
1004
Lastpage
1009
Abstract
In this paper a silicon subminiature microphone is described, which is based on the piezoelectric effect of spin-coated P(VDF/TrFE)-layers. The polymer layers are placed on top of a very thin silicon nitride membrane, which is implanted with boron ions in order to reduce the tensile stress of the diaphragm, resulting in higher microphone sensitivities. A maximum sensitivity of 150 μV/Pa, a bandwidth of about 16 kHz and an equivalent noise level of less than 60 dB(A) were measured. Considering the small area of the membrane of the microphone (1 mm2), the sensors show a much better performance than former microphones with piezoelectric polymer layers
Keywords
boron; micromachining; microphones; piezoelectric transducers; polymer films; silicon; silicon compounds; 16 kHz; 60 dB; Si-Si3N4:B; Si3N4:B membranes; bandwidth; equivalent noise level; higher microphone sensitivities; maximum sensitivity; micromachined Si subminiature microphones; piezoelectric P(VDF/TRFE)-layers; tensile stress; Bandwidth; Biomembranes; Boron; Microphones; Noise level; Noise measurement; Piezoelectric effect; Polymers; Silicon; Tensile stress;
fLanguage
English
Publisher
ieee
Conference_Titel
Electrets, 1994. (ISE 8), 8th International Symposium on
Conference_Location
Paris
Print_ISBN
0-7803-1940-0
Type
conf
DOI
10.1109/ISE.1994.515262
Filename
515262
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