• DocumentCode
    2384689
  • Title

    Micromachined silicon subminiature microphones with piezoelectric P(VDF/TRFE)-layers and silicon-nitride-membranes

  • Author

    Schellin, R. ; Heß, G. ; Kreßmann, R. ; Waßmuth, P.

  • Author_Institution
    Inst. for Telecommun. & Electroacoust., Tech. Univ. of Darmstadt, Germany
  • fYear
    1994
  • fDate
    7-9 Sep 1994
  • Firstpage
    1004
  • Lastpage
    1009
  • Abstract
    In this paper a silicon subminiature microphone is described, which is based on the piezoelectric effect of spin-coated P(VDF/TrFE)-layers. The polymer layers are placed on top of a very thin silicon nitride membrane, which is implanted with boron ions in order to reduce the tensile stress of the diaphragm, resulting in higher microphone sensitivities. A maximum sensitivity of 150 μV/Pa, a bandwidth of about 16 kHz and an equivalent noise level of less than 60 dB(A) were measured. Considering the small area of the membrane of the microphone (1 mm2), the sensors show a much better performance than former microphones with piezoelectric polymer layers
  • Keywords
    boron; micromachining; microphones; piezoelectric transducers; polymer films; silicon; silicon compounds; 16 kHz; 60 dB; Si-Si3N4:B; Si3N4:B membranes; bandwidth; equivalent noise level; higher microphone sensitivities; maximum sensitivity; micromachined Si subminiature microphones; piezoelectric P(VDF/TRFE)-layers; tensile stress; Bandwidth; Biomembranes; Boron; Microphones; Noise level; Noise measurement; Piezoelectric effect; Polymers; Silicon; Tensile stress;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electrets, 1994. (ISE 8), 8th International Symposium on
  • Conference_Location
    Paris
  • Print_ISBN
    0-7803-1940-0
  • Type

    conf

  • DOI
    10.1109/ISE.1994.515262
  • Filename
    515262