DocumentCode :
2385507
Title :
InP HBTs-present status and future trends
Author :
Brar, B. ; Li, J.C. ; Pierson, R.L. ; Higgins, J.A.
Author_Institution :
Rockwell Sci. Co., Thousand Oaks, CA, USA
fYear :
2002
fDate :
2002
Firstpage :
155
Lastpage :
161
Abstract :
The fundamental materials advantages of III-V compound semiconductors are described. InP-based HBTs are shown to be a promising technology for high performance applications where the speed-breakdown product must substantially exceed that available from Si/SiGe. The primary challenges for InP are scaling down the device size, while simultaneously scaling up the number of transistors per chip. The results of such scaling efforts are expected to enable ICs requiring tens of thousands of transistors with clock frequencies approaching 250 GHz with useful breakdown voltages.
Keywords :
III-V semiconductors; heterojunction bipolar transistors; indium compounds; InP; InP HBTs; breakdown voltages; clock frequencies; device size scaling down; speed-breakdown product; Breakdown voltage; Germanium silicon alloys; Heterojunction bipolar transistors; III-V semiconductor materials; Indium compounds; Indium gallium arsenide; Indium phosphide; Photonic band gap; Silicon germanium; Thermal conductivity;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Bipolar/BiCMOS Circuits and Technology Meeting, 2002. Proceedings of the 2002
ISSN :
1088-9299
Print_ISBN :
0-7803-7561-0
Type :
conf
DOI :
10.1109/BIPOL.2002.1042908
Filename :
1042908
Link To Document :
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