Title :
Sub 0.2 μm lithography on 300 mm wafer
Author :
Ganz, Dietmar ; Charles, Alain ; Hornig, Steffen R. ; Hraschan, Günther ; Koestler, Wolfram ; Maltabes, John ; Schedel, Thorsten ; Schmidt, Sebastian ; Mautz, Karl ; Schuster, Ralf
Author_Institution :
SENECONDUCTOR300, Dresden, Germany
Abstract :
We study the performance of the current 300mm lithography tool set for sub 0.2 μm processes. The results are discussed in terms of process capability and stability. It was determined that the non-linear errors which are much higher on 300 mm wafers than on 200 mm wafers had an influence, and this is discussed in detail. We determine the root causes for the stronger appearance of these effects and propose solutions to improve the overlay performance
Keywords :
ultraviolet lithography; 0.2 micron; 300 mm; lithography; nonlinear errors; process capability; process stability; Current measurement; Displacement measurement; Focusing; Lenses; Lighting; Lithography; Production; Resists; Silicon; Testing;
Conference_Titel :
Semiconductor Manufacturing, 2000. Proceedings of ISSM 2000. The Ninth International Symposium on
Conference_Location :
Tokyo
Print_ISBN :
0-7803-7392-8
DOI :
10.1109/ISSM.2000.993616
